標題: | Model based Sub-Resolution Assist Features Using an Inverse Lithography Method |
作者: | Yu, Jue-Chin Yu, Peichen Chao, Hsueh-Yung 光電工程學系 Department of Photonics |
關鍵字: | optical proximity correction;inverse lithography;sub-resolution assist features |
公開日期: | 2008 |
摘要: | The conventional segment-based OPC approach has been applied successfully for many CMOS generations and is currently favored. However, Inverse lithography technology (ILT) is a promising candidate for next-generation optical proximity correction (OPC). Still, there are issues that need to be thoroughly addressed and further optimized. In this work, we propose a model-based pre-OPC flow where the sizing of drawn patterns and placement of surrounding sub-resolution assist features (SRAF) are simultaneously generated in a single iteration using an ILT method. The complex patterns can then be simplified for a conventional OPC solution. |
URI: | http://hdl.handle.net/11536/30353 http://dx.doi.org/10.1117/12.804678 |
ISBN: | 978-0-8194-7381-3 |
ISSN: | 0277-786X |
DOI: | 10.1117/12.804678 |
期刊: | LITHOGRAPHY ASIA 2008 |
Volume: | 7140 |
Appears in Collections: | Conferences Paper |
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