標題: HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE
作者: CHIU, HT
HUANG, SC
交大名義發表
應用化學系
National Chiao Tung University
Department of Applied Chemistry
公開日期: 15-四月-1993
URI: http://hdl.handle.net/11536/3049
ISSN: 0261-8028
期刊: JOURNAL OF MATERIALS SCIENCE LETTERS
Volume: 12
Issue: 8
起始頁: 537
結束頁: 539
顯示於類別:期刊論文