標題: | HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE |
作者: | CHIU, HT HUANG, SC 交大名義發表 應用化學系 National Chiao Tung University Department of Applied Chemistry |
公開日期: | 15-四月-1993 |
URI: | http://hdl.handle.net/11536/3049 |
ISSN: | 0261-8028 |
期刊: | JOURNAL OF MATERIALS SCIENCE LETTERS |
Volume: | 12 |
Issue: | 8 |
起始頁: | 537 |
結束頁: | 539 |
顯示於類別: | 期刊論文 |