HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE

Title:	HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE
Authors:	CHIU, HT HUANG, SC 交大名義發表應用化學系 National Chiao Tung University Department of Applied Chemistry
Issue Date:	15-Apr-1993
URI:	http://hdl.handle.net/11536/3049
ISSN:	0261-8028
Journal:	JOURNAL OF MATERIALS SCIENCE LETTERS
Volume:	12
Issue:	8
Begin Page:	537
End Page:	539
Appears in Collections:	Articles

APA	CHIU, H., & HUANG, S. (1993). HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE. WOS:A1993KZ35100005.
Bibtex	@article{CHIU1993HYDROGEN, title={HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE}, author={CHIU, HT and HUANG, SC}, journal={WOS:A1993KZ35100005}, year={1993}, url={https://ir.lib.nycu.edu.tw/handle/11536/3049}, }