HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE

標題:	HYDROGEN PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANE
作者:	CHIU, HT HUANG, SC 交大名義發表應用化學系 National Chiao Tung University Department of Applied Chemistry
公開日期:	15-Apr-1993
URI:	http://hdl.handle.net/11536/3049
ISSN:	0261-8028
期刊:	JOURNAL OF MATERIALS SCIENCE LETTERS
Volume:	12
Issue:	8
起始頁:	537
結束頁:	539
Appears in Collections:	Articles