Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning

標題:	Low contact resistance of poly-plug structure by in-situ HF-vapour cleaning
作者:	Chen, JH Lei, TF Chao, TS Su, TP Huang, SJ Tuan, A Chen, SK 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
公開日期:	13-Apr-2000
摘要:	A low contact-resistance poly-plug structure realised by in-situ HF-vapour cleaning in a clustered tool is described. The native oxide in the contact area can be efficiently removed by the combination of an HF-dipping and in-situ HF-vapour cleaning process, resulting in a low specific contact resistance.
URI:	http://dx.doi.org/10.1049/el:20000580 http://hdl.handle.net/11536/30583
ISSN:	0013-5194
DOI:	10.1049/el:20000580
期刊:	ELECTRONICS LETTERS
Volume:	36
Issue:	8
起始頁:	756
結束頁:	757
Appears in Collections:	Articles

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