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dc.contributor.authorWang, YPen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2014-12-08T15:46:32Z-
dc.date.available2014-12-08T15:46:32Z-
dc.date.issued1999-06-01en_US
dc.identifier.issn0040-6090en_US
dc.identifier.urihttp://dx.doi.org/10.1016/S0040-6090(98)01497-7en_US
dc.identifier.urihttp://hdl.handle.net/11536/31300-
dc.description.abstractThrough the measurement of dielectric dispersion as a function of frequency (100 Hz less than or equal to f less than or equal to 1 MHz), we investigated the trapping dielectric relaxation of r.f.-sputtered (Ba0.5Sr0.5)TiO3 film and proposed an equivalent circuit on the basis of the admittance and capacitance spectra. Admittance spectral studies in the temperature range of 200-420 K revealed the existence of a trap level. The trap, located at 0.05 eV, is envisaged to be responsible for the origin of dielectric relaxation and carrier concentration. The equivalent circuit, consisting of a series trapping resistance and capacitance combination in parallel with leakage resistance and high frequency limit capacitance, is adopted to explain satisfactorily the AC response and to identify the contribution of the shallow trap on the electrical properties of BST thin film. (C) 1999 Elsevier Science S.A. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjectbarium strontium titanate oxide (BST)en_US
dc.subjectdielectric responseen_US
dc.subjectimpedanceen_US
dc.subjectCole ploten_US
dc.titleAnalysis of AC electrical response for radio-frequency sputtered (Ba0.5Sr0.5)TiO3 thin filmen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/S0040-6090(98)01497-7en_US
dc.identifier.journalTHIN SOLID FILMSen_US
dc.citation.volume346en_US
dc.citation.issue1-2en_US
dc.citation.spage269en_US
dc.citation.epage274en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000081019400037-
dc.citation.woscount3-
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