標題: EFFECT OF COPPER ADDITIVE ON THE MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE ZINC-OXIDE
作者: CHIOU, BS
CHUNG, MC
交大名義發表
電子工程學系及電子研究所
National Chiao Tung University
Department of Electronics Engineering and Institute of Electronics
公開日期: 1-十二月-1992
摘要: Nonohmic behavior is obtained for polycrystalline ZnO with copper as the only additive in the range 0.3 less-than-or-equal-to x less-than-or-equal-to 1 wt%. The effect of copper on the microstructure and electrical behavior of ZnO:Cu ceramics is investigated. The leakage current decreases and the breakdown electric field increases as the copper concentration increases. The large apparent dielectric constant of ZnO:Cu ceramic (k > > k(ZnO), k(ZnO) is the dielectric constant of pure ZnO) is attributed to the grain boundary barrier layer effect. A Schottky barrier height of 0.27-0.46 eV is obtained for various copper-added samples, depending on sintering temperatures.
URI: http://dx.doi.org/10.1111/j.1151-2916.1992.tb04435.x
http://hdl.handle.net/11536/3221
ISSN: 0002-7820
DOI: 10.1111/j.1151-2916.1992.tb04435.x
期刊: JOURNAL OF THE AMERICAN CERAMIC SOCIETY
Volume: 75
Issue: 12
起始頁: 3363
結束頁: 3368
顯示於類別:期刊論文