標題: | EFFECT OF COPPER ADDITIVE ON THE MICROSTRUCTURE AND ELECTRICAL-PROPERTIES OF POLYCRYSTALLINE ZINC-OXIDE |
作者: | CHIOU, BS CHUNG, MC 交大名義發表 電子工程學系及電子研究所 National Chiao Tung University Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-Dec-1992 |
摘要: | Nonohmic behavior is obtained for polycrystalline ZnO with copper as the only additive in the range 0.3 less-than-or-equal-to x less-than-or-equal-to 1 wt%. The effect of copper on the microstructure and electrical behavior of ZnO:Cu ceramics is investigated. The leakage current decreases and the breakdown electric field increases as the copper concentration increases. The large apparent dielectric constant of ZnO:Cu ceramic (k > > k(ZnO), k(ZnO) is the dielectric constant of pure ZnO) is attributed to the grain boundary barrier layer effect. A Schottky barrier height of 0.27-0.46 eV is obtained for various copper-added samples, depending on sintering temperatures. |
URI: | http://dx.doi.org/10.1111/j.1151-2916.1992.tb04435.x http://hdl.handle.net/11536/3221 |
ISSN: | 0002-7820 |
DOI: | 10.1111/j.1151-2916.1992.tb04435.x |
期刊: | JOURNAL OF THE AMERICAN CERAMIC SOCIETY |
Volume: | 75 |
Issue: | 12 |
起始頁: | 3363 |
結束頁: | 3368 |
Appears in Collections: | Articles |