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dc.contributor.authorLee, YSen_US
dc.contributor.authorTseng, TYen_US
dc.date.accessioned2014-12-08T15:49:21Z-
dc.date.available2014-12-08T15:49:21Z-
dc.date.issued1998-02-01en_US
dc.identifier.issn0957-4522en_US
dc.identifier.urihttp://hdl.handle.net/11536/32800-
dc.description.abstractGrain boundary glass crystallinity was studied to determine its effect on the electrical properties of ZnO-glass varistors. Si-rich glass at the grain boundary layer transformed into a crystalline zinc silicate phase after heat treatment. However, glass without any SiO2 was not recrystallized and remained amorphous following the same process. Variations in non-ohmic behaviour of the samples with three different glass additives are attributed to their different crystallinity. According to a proposed defect reaction equation, strong pinning of the barrier height was found in ZnO-glass varistors with crystallized glass phase. This would ultimately cause an increase in the alpha values, grain boundary barrier height, a breakdown voltage per grain and device stability. If charged ions such as V-o(.), are present due to the formation of the crystalline intergranular phase, the grain boundary barrier height and device stability would initially be enhanced by increased density of interface states, later decreasing due to the migration of zinc interstitials Zn-i(..) under electrical stress. Furthermore, results of deep-level transient spectroscopy, together with dielectric loss and Auger linescan analyses detected three electron traps: L2 is associated with the energy level of the second ionization of interstitial zinc atoms; and the broadness of the trap L3 is analogous to the energy level of the first ionization of oxygen vacancies; trap L1 has been identified as native defects. (C) 1998 Chapman & Hall.en_US
dc.language.isoen_USen_US
dc.titleCorrelation of grain boundary characteristics with electrical properties in ZnO-glass varistorsen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICSen_US
dc.citation.volume9en_US
dc.citation.issue1en_US
dc.citation.spage65en_US
dc.citation.epage76en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000071699800014-
dc.citation.woscount17-
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