DIFLUOROSILYLENE AS A PRECURSOR FOR THE CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE

標題:	DIFLUOROSILYLENE AS A PRECURSOR FOR THE CHEMICAL VAPOR-DEPOSITION OF TITANIUM SILICIDE
作者:	CHEN, CC YU, JL LEE, CY LIU, CS CHIU, HT 應用化學系 Department of Applied Chemistry
關鍵字:	CHEMICAL VAPOR DEPOSITION;TITANIUM SILICIDE;THIN FILM
公開日期:	1-Sep-1992
摘要:	A new method for preparing thin films of titanium silicide, TiSi2, by chemical vapour deposition of difluorosilylene and titanium tetrachloride is reported.
URI:	http://hdl.handle.net/11536/3309
ISSN:	0959-9428
期刊:	JOURNAL OF MATERIALS CHEMISTRY
Volume:	2
Issue:	9
起始頁:	983
結束頁:	984
Appears in Collections:	Articles

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