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dc.contributor.authorHuang, TYen_US
dc.contributor.authorJong, FCen_US
dc.contributor.authorChao, TSen_US
dc.contributor.authorLin, HCen_US
dc.contributor.authorLeu, LYen_US
dc.contributor.authorYoung, Ken_US
dc.contributor.authorLin, CHen_US
dc.contributor.authorChiu, KYen_US
dc.date.accessioned2014-12-08T15:01:30Z-
dc.date.available2014-12-08T15:01:30Z-
dc.date.issued1997-09-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.36.5459en_US
dc.identifier.urihttp://hdl.handle.net/11536/349-
dc.description.abstractThe effects of radiation on the characteristics of split-gate electrical erasable programmable read only memory (EEPROM)/flash cells with recently-proposed horn-shaped floating gates are studied in terms of cell read current; data retention, cycling endurance, program/erase efficiency, threshold voltage and junction leakage. Our results show that the cells appear to survive after 1 Mrad (Si) Co-60 irradiation. Moreover, the after-irradiation cell read current actually increases in the ''erase'' (i.e., low-threshold voltage, high-conducting) state (i.e., improves), albeit the cell read current also increases in the ''program'' (i.e., high-threshold voltage, low-conducting) state (i.e., a degradation). Our results also show that, despite an improvement in the initial read current in the ''erase'' state immediately after radiation, the write/erase cycling endurance of the flash cells is significantly impeded after irradiation, due to a much faster ''window closure'' rate in the ''erase'' state, although the cell read current is found to remain relatively stable in the ''program'' state after cycling.en_US
dc.language.isoen_USen_US
dc.subjectflash cellen_US
dc.subjectEEPROMen_US
dc.subjectnon-volatile memoryen_US
dc.subjecthorn-shaped floating gateen_US
dc.subjectradiation effectsen_US
dc.subjectrad-harden_US
dc.titleA study on the radiation hardness of flash cell with horn-shaped floating-gateen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.36.5459en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERSen_US
dc.citation.volume36en_US
dc.citation.issue9Aen_US
dc.citation.spage5459en_US
dc.citation.epage5463en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
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