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DC FieldValueLanguage
dc.contributor.authorCHIU, HTen_US
dc.contributor.authorLEE, SFen_US
dc.date.accessioned2014-12-08T15:05:05Z-
dc.date.available2014-12-08T15:05:05Z-
dc.date.issued1991-11-15en_US
dc.identifier.issn0261-8028en_US
dc.identifier.urihttp://dx.doi.org/10.1007/BF00722649en_US
dc.identifier.urihttp://hdl.handle.net/11536/3633-
dc.language.isoen_USen_US
dc.titleDEPOSITION OF SILICON-CARBIDE THIN-FILMS FROM DODECAMETHYLCYCLOHEXASILANEen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/BF00722649en_US
dc.identifier.journalJOURNAL OF MATERIALS SCIENCE LETTERSen_US
dc.citation.volume10en_US
dc.citation.issue22en_US
dc.citation.spage1323en_US
dc.citation.epage1325en_US
dc.contributor.department交大名義發表zh_TW
dc.contributor.department應用化學系zh_TW
dc.contributor.departmentNational Chiao Tung Universityen_US
dc.contributor.departmentDepartment of Applied Chemistryen_US
dc.identifier.wosnumberWOS:A1991GR01700011-
dc.citation.woscount7-
Appears in Collections:Articles


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