標題: | KEV ION-BEAM-EXPOSED POLY(METHYLISOPROPENYLKETONE) AND POLY(PHENYLISOPROPENYLKETONE) |
作者: | LOONG, WA PENG, NT 交大名義發表 應用化學系 National Chiao Tung University Department of Applied Chemistry |
關鍵字: | ION BEAM;POLY(METHYLISOPROPENYLKETONE);POLY(PHENYLISOPROPENYLKETONE);DEVELOPMENT DEPTH |
公開日期: | 1-Mar-1991 |
摘要: | The exposure characteristics of poly(methylisopropenylketone) (PMIPK) and poly(phenylisopropenylketone) (PPIPK) exposed to 40 and 80 keV H+ and B+ ion beams have been studied. It is found that the electron-rich phenyl group in PPIPK has increased stopping power for the bigger B+ ion, but not for the smaller H+ ion. For the same reason, the main chain scissioning of PPIPK is slower than that of PMIPK when they are exposed to B+, but not to H+, under the same exposure conditions. Linear relationships are found with simulation parameter A which stands for exposure efficiency of the ion beam as a function of exposure doses (keV x ion fluence) for a specific ion-exposed polymer within the used energy range. |
URI: | http://hdl.handle.net/11536/3853 |
ISSN: | 0021-4922 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS |
Volume: | 30 |
Issue: | 3 |
起始頁: | 603 |
結束頁: | 607 |
Appears in Collections: | Articles |
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