標題: FORMATION OF 0.1-MU-M N+ P JUNCTION BY AS+ IMPLANTATION THROUGH PT OR PTSI FILM
作者: TSUI, BY
CHEN, MC
交大名義發表
電控工程研究所
National Chiao Tung University
Institute of Electrical and Control Engineering
公開日期: 1-Apr-1990
URI: http://dx.doi.org/10.1063/1.345346
http://hdl.handle.net/11536/4142
ISSN: 0021-8979
DOI: 10.1063/1.345346
期刊: JOURNAL OF APPLIED PHYSICS
Volume: 67
Issue: 7
起始頁: 3524
結束頁: 3526
Appears in Collections:Articles