标题: | HIGH-TEMPERATURE STABILITY OF PLATINUM SILICIDE ASSOCIATED WITH FLUORINE IMPLANTATION |
作者: | TSAI, JY TSUI, BY CHEN, MC 交大名义发表 电控工程研究所 National Chiao Tung University Institute of Electrical and Control Engineering |
公开日期: | 1-四月-1990 |
URI: | http://dx.doi.org/10.1063/1.345327 http://hdl.handle.net/11536/4143 |
ISSN: | 0021-8979 |
DOI: | 10.1063/1.345327 |
期刊: | JOURNAL OF APPLIED PHYSICS |
Volume: | 67 |
Issue: | 7 |
起始页: | 3530 |
结束页: | 3533 |
显示于类别: | Articles |