| 標題: | COMPOSITIONAL DEPENDENCE OF THERMAL-STABILITY OF REFRACTORY-METAL SILICIDE SCHOTTKY CONTACTS TO GAAS |
| 作者: | LEE, CP LIU, TH WU, SC 奈米中心 Nano Facility Center |
| 公開日期: | 1-Sep-1989 |
| URI: | http://dx.doi.org/10.1007/BF02657477 http://hdl.handle.net/11536/4302 |
| ISSN: | 0361-5235 |
| DOI: | 10.1007/BF02657477 |
| 期刊: | JOURNAL OF ELECTRONIC MATERIALS |
| Volume: | 18 |
| Issue: | 5 |
| 起始頁: | 623 |
| 結束頁: | 626 |
| Appears in Collections: | Articles |

