CHARACTERISTICS OF TITANIUM SILICIDE FORMED BY SI/MO/TI TRILAYER METALLIZATION

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DC Field	Value	Language
dc.contributor.author	CHIOU, BS	en_US
dc.contributor.author	YANG, BJ	en_US
dc.contributor.author	CHANG, PH	en_US
dc.date.accessioned	2014-12-08T15:05:52Z	-
dc.date.available	2014-12-08T15:05:52Z	-
dc.date.issued	1989-03-01	en_US
dc.identifier.issn	0268-1242	en_US
dc.identifier.uri	http://dx.doi.org/10.1088/0268-1242/4/3/007	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4400	-
dc.language.iso	en_US	en_US
dc.title	CHARACTERISTICS OF TITANIUM SILICIDE FORMED BY SI/MO/TI TRILAYER METALLIZATION	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1088/0268-1242/4/3/007	en_US
dc.identifier.journal	SEMICONDUCTOR SCIENCE AND TECHNOLOGY	en_US
dc.citation.volume	4	en_US
dc.citation.issue	3	en_US
dc.citation.spage	177	en_US
dc.citation.epage	183	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電子物理學系	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Department of Electrophysics	en_US
dc.identifier.wosnumber	WOS:A1989T587400007	-
dc.citation.woscount	2	-
Appears in Collections:	Articles

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