SUPERIOR CHARACTERISTICS OF THERMAL OXIDE LAYERS GROWN ON AMORPHOUS-SILICON FILMS

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	WU, CY	en_US
dc.contributor.author	CHEN, CF	en_US
dc.date.accessioned	2014-12-08T15:06:04Z	-
dc.date.available	2014-12-08T15:06:04Z	-
dc.date.issued	1987-04-27	en_US
dc.identifier.issn	0003-6951	en_US
dc.identifier.uri	http://dx.doi.org/10.1063/1.97951	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4646	-
dc.language.iso	en_US	en_US
dc.title	SUPERIOR CHARACTERISTICS OF THERMAL OXIDE LAYERS GROWN ON AMORPHOUS-SILICON FILMS	en_US
dc.type	Article	en_US
dc.identifier.doi	10.1063/1.97951	en_US
dc.identifier.journal	APPLIED PHYSICS LETTERS	en_US
dc.citation.volume	50	en_US
dc.citation.issue	17	en_US
dc.citation.spage	1167	en_US
dc.citation.epage	1169	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	工學院	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	College of Engineering	en_US
dc.identifier.wosnumber	WOS:A1987G970700018	-
dc.citation.woscount	2	-
顯示於類別：	期刊論文