A CHARACTERIZATION MODEL FOR CONSTANT CURRENT STRESSED VOLTAGE-TIME CHARACTERISTICS OF THIN THERMAL OXIDES GROWN ON SILICON SUBSTRATE

doi:10.1063/1.337515

標題:	A CHARACTERIZATION MODEL FOR CONSTANT CURRENT STRESSED VOLTAGE-TIME CHARACTERISTICS OF THIN THERMAL OXIDES GROWN ON SILICON SUBSTRATE
作者:	CHEN, CF WU, CY 交大名義發表工學院 National Chiao Tung University College of Engineering
公開日期:	1-Dec-1986
URI:	http://dx.doi.org/10.1063/1.337515 http://hdl.handle.net/11536/4693
ISSN:	0021-8979
DOI:	10.1063/1.337515
期刊:	JOURNAL OF APPLIED PHYSICS
Volume:	60
Issue:	11
起始頁:	3926
結束頁:	3944
Appears in Collections:	Articles