A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS

標題:	A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS
作者:	TSENG, HH WU, CY 工學院 College of Engineering
公開日期:	1-Nov-1986
URI:	http://hdl.handle.net/11536/4704
ISSN:	0741-3106
期刊:	IEEE ELECTRON DEVICE LETTERS
Volume:	7
Issue:	11
起始頁:	623
結束頁:	624
Appears in Collections:	Articles

Files in This Item:

If it is a zip file, please download the file and unzip it, then open index.html in a browser to view the full text content.