標題: 鈦-銅箔層接合電引入裝置中Kovar合金與氧化鋁界面反應
Interfacial Reactions of Ti-Cu Foil Jointed Kovar Alloy-Alumina for Feehthrough Application
作者: 郭柏良
Kuo, Po-Liang
林健正
Lin, Chien-Cheng
材料科學與工程學系
關鍵字: 金屬箔片;測漏率;界面反應;kovar;alumina;interface
公開日期: 2010
摘要: 本實驗探討利用鈦、銅、鎳等金屬箔片接合電引入裝置中Kovar合金與Al2O3,並檢測漏氣率;金屬箔片組合會影響測漏率,其中以鈦箔與Al2O3相鄰的試片測漏率較佳。將測漏率較佳的試片(Al2O3/Ti/ Cu/Kovar),以不同溫度但相同的時間來探討生成機構,利用SEM/ TEM觀察Al2O3/Ti/Cu/Kovar反應物之變化。試片經過900oC/0.5hr熱處理之後,在Al2O3/Ti之間形成Ti(Al, O)和Ti3(Cu, Al)3O。而Ti-Cu之間生成TiCu、 Ti2Cu3、TiCu4。Kovar/Cu之間會形成FeTi。950oC時,Al2O3/Ti之間反應形成TiO、Ti3(Cu, Al)3O。而Ti-Cu之間生成Ti2Cu、Ti3Cu4、TiCu2、TiCu4和Cu。在Kovar/Cu界面以Ti-Fe的化合物為主,反應層有FeTi和Fe2Ti,FeTi可溶解銅,形成(Fe, Cu)Ti。1000oC時,Ti-Cu很快生成液相,Al2O3/Ti之間會生成Ti4Cu2O。而Kovar的鐵進入液相參與反應;鐵和銅皆為β-Ti的穩定元素,凝固生成β-Ti(Fe, Cu);TiCu、(Fe, Cu) Ti是從液相中降溫形成;Kovar/Cu界面形成了兩層連續反應層,分別為(Fe,Cu)Ti和Fe2Ti。
This work presents leak rate of different metal foils(Ti, Cu, Ni) to joint Kovar Alloy-Alumina. The sample (Al2O3/Ti/Cu/Kovar) has the better leak rate. The microstructure of the reaction interface in this sample were characterized using scanning electron microscopy (SEM) and analytical transmission electron microscopy (TEM/EDS). At 900oC, the Ti(Al, O) and Ti3(Cu, Al)3O were formed between Al2O3 and ti foil after bonding process. And TiCu, Ti2Cu3 were formed by ti-cu foils. At the phase at Kovar/Cu interface was FeTi. At 950oC, the TiO, Ti3(Cu, Al)3O were formed at Al2O3/Ti interface. Ti2Cu, Ti3Cu4, TiCu2, TiCu4, Cu were formed by ti-cu foils. The interlayers of (Fe, Cu)Ti and Fe2Ti were formed between Kovar and cu foil. At high Temperature 1000◦C, Ti4Cu2O was formed by Ti-rich solution. And β-Ti(Fe, Cu), TiCu, (Fe, Cu)Ti were formed by ti, cu and fe elements. And the interlayers of (Fe, Cu)Ti and Fe2Ti were formed between Kovar and cu foil.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT079818566
http://hdl.handle.net/11536/47392
顯示於類別:畢業論文


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