MOBILITY MODELS FOR THE IV CHARACTERISTICS OF BURIED-CHANNEL MOSFETS

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	WU, CY	en_US
dc.contributor.author	HSU, KC	en_US
dc.date.accessioned	2014-12-08T15:06:13Z	-
dc.date.available	2014-12-08T15:06:13Z	-
dc.date.issued	1985	en_US
dc.identifier.issn	0038-1101	en_US
dc.identifier.uri	http://hdl.handle.net/11536/4804	-
dc.language.iso	en_US	en_US
dc.title	MOBILITY MODELS FOR THE IV CHARACTERISTICS OF BURIED-CHANNEL MOSFETS	en_US
dc.type	Article	en_US
dc.identifier.journal	SOLID-STATE ELECTRONICS	en_US
dc.citation.volume	28	en_US
dc.citation.issue	9	en_US
dc.citation.spage	917	en_US
dc.citation.epage	923	en_US
dc.contributor.department	交大名義發表	zh_TW
dc.contributor.department	電控工程研究所	zh_TW
dc.contributor.department	National Chiao Tung University	en_US
dc.contributor.department	Institute of Electrical and Control Engineering	en_US
dc.identifier.wosnumber	WOS:A1985AQX1400011	-
dc.citation.woscount	8	-
顯示於類別：	期刊論文