濕蝕刻製程之無彩紋控制

Abstract

TFT-LCD尺寸從G1迅速進步到G8.5，線寬從數十微米縮小數微米的新世代，TFT-LCD的技術越是成熟，市場就越是普及，因而客戶對於面板品質要求越來越高，從3亮點3暗點的保證，至今是無亮暗點的保證，而彩紋的發生更是影響面板明暗對比的關鍵。 所以在TFT-LCD邁向成為高階電子產品之路，顯示度的完美將成為必要的條件之一，因此在製造的過程當中一個的微小的缺陷，幾乎已經不被客戶所允許。而在TFT-LCD製程中Wet Etch Process為線寬與彩紋控制的關鍵製程。故希望能穩定的控制線寬與彩紋在出貨的標準內，Wet Etch Process將是最為關鍵的製程之一。 本論文所研究的方向利用因果舉證法與田口實驗法分別針對蝕刻機台可能造成彩紋的原因做出篩選，透過田口實驗法找出真因後，進而對製程條件做出改善對應，最終使得濕蝕刻製程達到無彩紋發生。

TFT-LCD Size the rapid progress from G1 to G8.5, Narrow line width from tens of microns to several microns in new generation, Of TFT-LCD technology, the more mature markets the more popular, so customers are increasingly demanding high quality panel, From the three bright and three dark spots to ensure, so far is no guarantee of bright and dark points, while the mura of occurrence is the key chiaroscuro effects panel. Therefore, a TFT-LCD high-end electronic products towards the road to show the necessary degree of perfection will become one of the conditions, so the manufacturing process of a small defect, the customer is almost not allowed. In the TFT-LCD manufacturing process Wet Etch Process control for the line width and color pattern of the key processes,It hopes to control the line width and color stable pattern in the standard shipping within, Wet Etch Process is one of the most critical processes. This paper studied the direction of the Evidence Act and the use of causal Taguchi experimental method were etching machine for possible reasons to make a mura, Through the Taguchi method to find true because, after, and then make improvements to the corresponding process conditions, and developed a new tool to obtain non-pressure liquid mainland, South Korea, Taiwan, the three patents, and eventually wet etching process to occur without mura.