標題: | A MODEL FOR THE DEPOSITION OF PHOSPHORUS IN SILICON |
作者: | GUO, SF 電控工程研究所 Institute of Electrical and Control Engineering |
公開日期: | 1982 |
URI: | http://hdl.handle.net/11536/4985 |
ISSN: | 0013-4651 |
期刊: | JOURNAL OF THE ELECTROCHEMICAL SOCIETY |
Volume: | 129 |
Issue: | 3 |
起始頁: | C101 |
結束頁: | C101 |
顯示於類別: | 期刊論文 |