A SIMPLE-MODEL FOR THE DEPOSITION OF BORON IN SILICON BY USING A BN DIFFUSION SOURCE

標題:	A SIMPLE-MODEL FOR THE DEPOSITION OF BORON IN SILICON BY USING A BN DIFFUSION SOURCE
作者:	GUO, SF 交大名義發表電控工程研究所 National Chiao Tung University Institute of Electrical and Control Engineering
公開日期:	1980
URI:	http://hdl.handle.net/11536/5061
ISSN:	0013-4651
期刊:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	127
Issue:	11
起始頁:	2506
結束頁:	2509
Appears in Collections:	Articles

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