標題: REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS
作者: GUO, SF
CHU, TY
交大名義發表
National Chiao Tung University
公開日期: 1980
URI: http://hdl.handle.net/11536/5076
ISSN: 0013-4651
期刊: JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume: 127
Issue: 3
起始頁: C93
結束頁: C93
顯示於類別:期刊論文