REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS

標題:	REDISTRIBUTION OF DEPOSITED BORON IN SILICON DURING DRY O2 AND TCE O2 OXIDATIONS
作者:	GUO, SF CHU, TY 交大名義發表 National Chiao Tung University
公開日期:	1980
URI:	http://hdl.handle.net/11536/5076
ISSN:	0013-4651
期刊:	JOURNAL OF THE ELECTROCHEMICAL SOCIETY
Volume:	127
Issue:	3
起始頁:	C93
結束頁:	C93
Appears in Collections:	Articles