多層結構矽化鎢之特性

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DC Field	Value	Language
dc.contributor.author	饒鴻麟	en_US
dc.contributor.author	RAO, HONG-LIN	en_US
dc.contributor.author	邱碧秀	en_US
dc.contributor.author	GIU, BI-XIU	en_US
dc.date.accessioned	2014-12-12T02:03:39Z	-
dc.date.available	2014-12-12T02:03:39Z	-
dc.date.issued	1985	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT742430016	en_US
dc.identifier.uri	http://hdl.handle.net/11536/52418	-
dc.description.abstract	在積體電路中，矽化鎢經常被用作內部連線，如鎢含量較高時，則有相當嚴重的掀裂及氧化問題。本報告即在探討多層結構矽化鎢之應用，以防止掀裂及氧化。多層結構矽化鎢被證實能防止鎢的氧化，而分段退火則可避免掀裂，且能維持矽化鎢的低電阻特性。	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	矽化鎢	zh_TW
dc.subject	鎢	zh_TW
dc.subject	積體電路	zh_TW
dc.title	多層結構矽化鎢之特性	zh_TW
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis