Parameter extraction in polysilicon nanowire MOSFETs using new double integration-based procedure

標題:	Parameter extraction in polysilicon nanowire MOSFETs using new double integration-based procedure
作者:	Ortiz-Conde, A. Rey, A. D. Latorre Liu, W. Chen, W. -C. Lin, H. -C. Liou, J. J. Muci, J. Garcia-Sanchez, F. J. 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics
關鍵字:	Parameter extraction;Threshold voltage;Subthreshold Slope;Double integration;Successive integration;Polysilicon;Nanowire;MOSFETs;Noise reduction
公開日期:	1-六月-2010
摘要:	A new double integration-based method to extract model parameters is applied to experimental polysilicon nanowire MOSFETs. The threshold voltage and Subthreshold Slope factor are extracted from noisy measured current-voltage characteristics. It is shown that the present method offers advantages over previous extraction procedures regarding data noise reduction. In addition, the normalized mutual integral difference operator method is scrutinized and an improvement of the method is presented. (C) 2010 Elsevier Ltd. All rights reserved.
URI:	http://dx.doi.org/10.1016/j.sse.2010.01.011 http://hdl.handle.net/11536/5303
ISSN:	0038-1101
DOI:	10.1016/j.sse.2010.01.011
期刊:	SOLID-STATE ELECTRONICS
Volume:	54
Issue:	6
起始頁:	635
結束頁:	641
顯示於類別：	期刊論文

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