Title: The Investigation of Nano-Roughening Effect on the Reliability Enhancement of Adhesive Bond for NEMS Manufacture Application
Authors: Yang, Chia-Yeh
Cheng, Yu-Ting
Hsu, Wen-Syang
機械工程學系
電子工程學系及電子研究所
Department of Mechanical Engineering
Department of Electronics Engineering and Institute of Electronics
Keywords: Hermetic encapsulation;nano-electromechanical systems (NEMS) manufacture;nano-roughening;scaling rule;ultraviolet (UV) adhesive bonding
Issue Date: 1-May-2010
Abstract: The paper shows the importance of nano-roughening on the bonding interface to the reliability enhancement of adhesive bond for ensuring the continuation of packaging shrinkage from MEMS to NEMS. The roughening is realized via a nonuniformly etching characteristic of PR which is etched and then utilized as an etching mask for following silicon etching process. Ultraviolet adhesive for silicon-to-glass bonding is utilized for the verification of the nano-roughening effect on NEMS hermetic encapsulation. The average roughnesses of the silicon substrate before and after roughening are 0.4 nm and 12.4 nm, respectively. Experimental results show that the roughness increase of silicon substrate can effectively provide more than 30% bonding strength enhancement and 30% leakage reduction. In addition, stamp-and-stick test shows that nano-roughening indeed provides a better adhesive characteristic that can further ensure the success of the stamp-and-stick process for nano/microfabrication.
URI: http://dx.doi.org/10.1109/TADVP.2009.2038235
http://hdl.handle.net/11536/5497
ISSN: 1521-3323
DOI: 10.1109/TADVP.2009.2038235
Journal: IEEE TRANSACTIONS ON ADVANCED PACKAGING
Volume: 33
Issue: 2
Begin Page: 356
End Page: 361
Appears in Collections:Articles


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