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dc.contributor.authorHsieh, C. Y.en_US
dc.contributor.authorChen, C. S.en_US
dc.contributor.authorTsou, W. A.en_US
dc.contributor.authorYeh, Y. T.en_US
dc.contributor.authorWen, K. A.en_US
dc.contributor.authorFan, L-Sen_US
dc.date.accessioned2014-12-08T15:07:07Z-
dc.date.available2014-12-08T15:07:07Z-
dc.date.issued2010-04-01en_US
dc.identifier.issn0960-1317en_US
dc.identifier.urihttp://dx.doi.org/10.1088/0960-1317/20/4/045017en_US
dc.identifier.urihttp://hdl.handle.net/11536/5585-
dc.description.abstractA novel post-CMOS fabrication process has been developed to transform a 0.18 mu m 1P6M mixed-signal/RF CMOS (complementary metal oxide semiconductor)-integrated circuit chips fabricated on an 8 inch SOI (silicon-on-insulator) wafer into flexible devices sandwiched between biocompatible material (10 mu m parylene-C on both sides in this case) and enables future implementation of implantable and fully integrated electronic devices. The functionality of the flexible integrated circuits is demonstrated by a low phase noise RF CMOS VCO (voltage-controlled oscillator) circuit in a ring oscillator configuration that operates at a few hundred MHz to GHz. We report here the associated post-processing technology to make these flexible IC chips and the characterization of both MOS transistors and the demonstration circuit on the flexible IC chip under bending stresses.en_US
dc.language.isoen_USen_US
dc.titleA flexible mixed-signal/RF CMOS technology for implantable electronics applicationsen_US
dc.typeArticleen_US
dc.identifier.doi10.1088/0960-1317/20/4/045017en_US
dc.identifier.journalJOURNAL OF MICROMECHANICS AND MICROENGINEERINGen_US
dc.citation.volume20en_US
dc.citation.issue4en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
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