矽化鉑在積體電路應用上之材料性質與製程技術

Full metadata record

DC Field	Value	Language
dc.contributor.author	崔秉銊	en_US
dc.contributor.author	陳茂傑	en_US
dc.date.accessioned	2014-12-12T02:10:05Z	-
dc.date.available	2014-12-12T02:10:05Z	-
dc.date.issued	1991	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT804430030	en_US
dc.identifier.uri	http://hdl.handle.net/11536/56483	-
dc.language.iso	en_US	en_US
dc.title	矽化鉑在積體電路應用上之材料性質與製程技術	zh_TW
dc.title	Material Properties and Process Technologies of Platinum silicide Relevant to VLSI Applications	en_US
dc.type	Thesis	en_US
dc.contributor.department	電子研究所	zh_TW
Appears in Collections:	Thesis