| 標題: | 自動對準矽化鈷技術在極大型積體電路上的應用 Self-aligned cobalt silicide technology for ULSI applications |
| 作者: | 陳炳勳 Chen, Bing Xun 陳茂傑 Chen, Mao Jie 電子研究所 |
| 公開日期: | 1993 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT822430016 http://hdl.handle.net/11536/58529 |
| 顯示於類別： | 畢業論文 |
- 矽化鈷在奈米級超大型積體電路應用之研究 / 陳燕銘;涂肇嘉
- 矽化鎳在超大型積體電路之應用研究(II) / 陳茂傑
- Width-dependent anomalous CoSix sheet resistance change by Ti and TiN capping process / Chen, YM;Tu, GC;Wang, YL
- FORMATION OF SELF-ALIGNED COBALT SILICIDE IN NORMAL FLOW NITROGEN FURNACE / YANG, FM;CHEN, MC
- Effective electrostatic discharge protection circuit design using novel fully silicided N-MOSFETs in sub-100-nm device era. / Lee, JW;Li, YM
- FORMATION OF COBALT SILICIDE UNDER A PASSIVATING FILM OF MOLYBDENUM OR TUNGSTEN / YANG, FM;CHEN, MC
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