| 標題: | 電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用 Characteristics of plasma-enhanced chemical vapor deposited low-temperature insulating films and their applications to thin-film transistors |
| 作者: | 謝守偉 Xie, Shou Wei 張俊彥 Zhang, Jun Yan 電子研究所 |
| 公開日期: | 1993 |
| URI: | http://140.113.39.130/cdrfb3/record/nctu/#NT822430025 http://hdl.handle.net/11536/58539 |
| 顯示於類別： | 畢業論文 |
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