電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用

標題:	電漿輔助化學氣相沈積低溫絕緣層之特性研究及其在薄膜電晶體上之應用 Characteristics of plasma-enhanced chemical vapor deposited low-temperature insulating films and their applications to thin-film transistors
作者:	謝守偉 Xie, Shou Wei 張俊彥 Zhang, Jun Yan 電子研究所
公開日期:	1993
URI:	http://140.113.39.130/cdrfb3/record/nctu/#NT822430025 http://hdl.handle.net/11536/58539
Appears in Collections:	Thesis