標題: 電漿輔助化學氣相沉積之介電質在化學機械研磨中特性與製程整合之研究
Chemical Mechanical Polishing of PECVD Dielectrics: Characterization and Process Integration
作者: 林啟發
Lin, Chi-Fa
馮明憲
Ming-Shiann Feng
材料科學與工程學系
關鍵字: 電漿輔助化學氣相沉積;介電質;化學機械研磨;PECVD;Dielectric;CMP
公開日期: 1995
URI: http://140.113.39.130/cdrfb3/record/nctu/#NT840159012
http://hdl.handle.net/11536/60187
Appears in Collections:Thesis