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dc.contributor.author钟文杰en_US
dc.contributor.authorChung, Wen-Jyeen_US
dc.contributor.author虞孝成en_US
dc.contributor.authorHaiao-Cheng Yuen_US
dc.date.accessioned2014-12-12T02:14:57Z-
dc.date.available2014-12-12T02:14:57Z-
dc.date.issued1995en_US
dc.identifier.urihttp://140.113.39.130/cdrfb3/record/nctu/#NT840230011en_US
dc.identifier.urihttp://hdl.handle.net/11536/60238-
dc.description.abstract本研究的对象是积体电路制程中的微影技术，对其现有功能与未来发展趋
势进行分析，并 以个案研究的方式验证KT式方法在微影制程机台评选之
应用可行性，建立了系统化的 机台评估方法。
研究的结果，在微影制程与其技术分析方面，可供业者作为参考；同时个
案研究部份的评 估方法与过程可运用在企业的经营与决策上，帮助业者
提升经营的效率及降低决策错误的 风险。
This study researches the photolithography technology in IC
manufacturing process. Its function and technology
developing trend were analysed. Beside that, this study
verified the capability of KT method in lithographic mechanes'
evaluation by a case study. That built up a systematic method
for mechane selection.
The study result of photolithography process and its technology
analysis is useful to IC manufacturers. In the same time, the
evaluation procedure of case study can be applied to
companies' management. It helps managers to improve
their efficiency and reduces the risk of error-decision.		zh_TW
dc.language.isozh_TWen_US
dc.subject微影制程zh_TW
dc.subject趋势分析zh_TW
dc.subjectKT式方法zh_TW
dc.subject技术评估zh_TW
dc.subjectPhotolithographyen_US
dc.subjectTrend analysisen_US
dc.subjectKT methoden_US
dc.subjectTechnology evalustionen_US
dc.title积体电路微影制程技术的趋势分析与评估个案zh_TW
dc.titleA Trand Analysis and Evaluation Case Study for the Photolithography Technology in IC Manufacturing Processen_US
dc.typeThesisen_US
dc.contributor.department科技管理研究所zh_TW
显示于类别：Thesis


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