完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 楊禮嘉 | en_US |
dc.contributor.author | Yang, Li-Chia | en_US |
dc.contributor.author | 張國明, 黃宇中 | en_US |
dc.contributor.author | Kow-Ming Chang, Yu-Chung Hung | en_US |
dc.date.accessioned | 2014-12-12T02:15:37Z | - |
dc.date.available | 2014-12-12T02:15:37Z | - |
dc.date.issued | 1995 | en_US |
dc.identifier.uri | http://140.113.39.130/cdrfb3/record/nctu/#NT840430084 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/60689 | - |
dc.description.abstract | 微小機電系統已被預測將成為工業界的明日之星.矽的機械性質可藉由IC 技術被應用在很多日常生活方面.在所有的應用當中,以微小感測器和微小 制動器在這個領域當中最具代表性. 本篇論文的重點放在具有三電極的電 容式壓力感測器的製造過程.詳細的製程技術研究將被提出.特別在空穴形 成以及高濃度硼攙雜層的形成.我們也稍微提了一點點有關設計考量的介 紹. 最後,為了提升電容式壓力感測器的研究,我們在第四章做了一個誠摯 的省思. Microelectromechanical systems (MEMS) is predicted to be the star offuture industry. By means of the IC technology, the mechanical properties ofsilicon can be applied to many fields in our life. Microsensors and microactuators are the typical applications in this field, among the otherthings. The key point of this thesis focuses on the fabrication processes of the three electrodes capacitive pressure sensor. A detailed study of processes will be showed, especially in cavity formation and p+ layer formation.Nevertheless, we also mention an introduction about the design considerations. Finally, to improve the study of capacitive pressure sensor, we give a sincerethinking in chapter four. | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.subject | 微小機電系統 | zh_TW |
dc.subject | 電容式壓力感測器 | zh_TW |
dc.subject | 空穴 | zh_TW |
dc.subject | 高濃度硼摻雜層 | zh_TW |
dc.subject | MEMS | en_US |
dc.subject | capacitive pressure sensor | en_US |
dc.subject | cavity | en_US |
dc.subject | P+ layer | en_US |
dc.title | 三電極電容式壓力感測器 | zh_TW |
dc.title | Three Electrodes Capacitive Pressure Sensor | en_US |
dc.type | Thesis | en_US |
dc.contributor.department | 電子研究所 | zh_TW |
顯示於類別: | 畢業論文 |