氧氣電漿灰化技術在光阻減薄技術應用上的特性研究及均勻度控制

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	郭俊伊	en_US
dc.contributor.author	Kuo, Chun Yi	en_US
dc.contributor.author	馮明憲	en_US
dc.contributor.author	Ming Shiann Feng	en_US
dc.date.accessioned	2014-12-12T02:17:04Z	-
dc.date.available	2014-12-12T02:17:04Z	-
dc.date.issued	1996	en_US
dc.identifier.uri	http://140.113.39.130/cdrfb3/record/nctu/#NT850159034	en_US
dc.identifier.uri	http://hdl.handle.net/11536/61611	-
dc.language.iso	zh_TW	en_US
dc.subject	電漿灰化	zh_TW
dc.subject	光阻減薄	zh_TW
dc.subject	非均向性比值	zh_TW
dc.subject	巨觀負載效應	zh_TW
dc.subject	均勻度偏移	zh_TW
dc.subject	Plasma ashing	en_US
dc.subject	Resist thinning	en_US
dc.subject	Anisotropic ratio	en_US
dc.subject	Macroloading effect	en_US
dc.subject	Unifromity deviation	en_US
dc.title	氧氣電漿灰化技術在光阻減薄技術應用上的特性研究及均勻度控制	zh_TW
dc.title	Characterization and Uniformity Control of Resist Thinning Using Plasma Ashing Technology	en_US
dc.type	Thesis	en_US
dc.contributor.department	材料科學與工程學系	zh_TW
顯示於類別：	畢業論文