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dc.contributor.authorLiu, Shu-Yenen_US
dc.contributor.authorSheu, J. K.en_US
dc.contributor.authorYe, Jhao-Chengen_US
dc.contributor.authorTu, S. J.en_US
dc.contributor.authorHsu, Che-Kangen_US
dc.contributor.authorLee, M. L.en_US
dc.contributor.authorKuo, C. H.en_US
dc.contributor.authorLai, W. C.en_US
dc.date.accessioned2014-12-08T15:07:50Z-
dc.date.available2014-12-08T15:07:50Z-
dc.date.issued2010en_US
dc.identifier.issn0013-4651en_US
dc.identifier.urihttp://hdl.handle.net/11536/6172-
dc.identifier.urihttp://dx.doi.org/10.1149/1.3499327en_US
dc.description.abstractTo reduce light reflection and enlarge the effective reaction surface area at the n-GaN/electrolyte interface, n-GaN epitaxial layers with naturally textured surface are utilized. The layers are combined with Cr/Au ohmic contacts on n-GaN to form working electrodes that generate hydrogen by direct photoelectrolysis of water. Although the surface reflection on the naturally textured n-GaN samples is lower than that on n-GaN epitaxial layers with flat surface, our results reveal that the photocurrent (I(ph)) and gas generation rates (R(gas)) obtained from the naturally rough n-GaN samples are lower than those from the flat samples. The results can be attributed to the fact that the rough n-GaN surface caused by dense surface pits leads to significant recombination of photogenerated carriers with charged defects; this occurs before carriers reach the ohmic contacts, thereby resulting in lower I(ph) and R(gas). Related analyses have been performed and presented in this paper to initially explain the possible mechanism. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3499327] All rights reserved.en_US
dc.language.isoen_USen_US
dc.titleCharacterization of n-GaN with Naturally Textured Surface for Photoelectrochemical Hydrogen Generationen_US
dc.typeArticleen_US
dc.identifier.doi10.1149/1.3499327en_US
dc.identifier.journalJOURNAL OF THE ELECTROCHEMICAL SOCIETYen_US
dc.citation.volume157en_US
dc.citation.issue12en_US
dc.citation.spageH1106en_US
dc.citation.epageH1109en_US
dc.contributor.department照明與能源光電研究所zh_TW
dc.contributor.departmentInstitute of Lighting and Energy Photonicsen_US
dc.identifier.wosnumberWOS:000283938300078-
dc.citation.woscount4-
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