完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Chang, Tsu | en_US |
dc.contributor.author | Kao, Hsuan-Ling | en_US |
dc.contributor.author | Chen, Y. J. | en_US |
dc.contributor.author | Chin, Albert | en_US |
dc.date.accessioned | 2014-12-08T15:07:59Z | - |
dc.date.available | 2014-12-08T15:07:59Z | - |
dc.date.issued | 2010 | en_US |
dc.identifier.issn | 0021-4922 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/6275 | - |
dc.identifier.uri | http://dx.doi.org/10.1143/JJAP.49.034201 | en_US |
dc.description.abstract | We have characterized and modeled the radio frequency (RF) power performance of a 0.18 mu m asymmetric-lightly-doped-drain metal-oxide-semiconductor field-effect transistor (LDD MOSFET). In comparison with the conventional 0.18 mu m MOSFET, this asymmetric-LDD device shows a larger power density of 0.54 W/mm, and 8 dB better adjacent channel power ratio (ACPR) linearity at 2.4 GHz from the improved twice DC breakdown voltage of 6.9 V. These significant improvements of RF power performance in the asymmetric-LDD transistor are important for the medium RF power amplifier application. (C) 2010 The Japan Society of Applied Physics | en_US |
dc.language.iso | en_US | en_US |
dc.title | Improved Radio Frequency Power Characteristics of Complementary Metal-Oxide-Semiconductor-Compatible Asymmetric-Lightly-Doped-Drain Metal-Oxide-Semiconductor Transistor | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1143/JJAP.49.034201 | en_US |
dc.identifier.journal | JAPANESE JOURNAL OF APPLIED PHYSICS | en_US |
dc.citation.volume | 49 | en_US |
dc.citation.issue | 3 | en_US |
dc.contributor.department | 電子工程學系及電子研究所 | zh_TW |
dc.contributor.department | Department of Electronics Engineering and Institute of Electronics | en_US |
dc.identifier.wosnumber | WOS:000276386100044 | - |
dc.citation.woscount | 0 | - |
顯示於類別: | 期刊論文 |