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dc.contributor.authorHuang, Hung-Wenen_US
dc.contributor.authorLin, Chung-Hsiangen_US
dc.contributor.authorHuang, Zhi-Kaien_US
dc.contributor.authorLee, Kang-Yuanen_US
dc.contributor.authorYu, Chang-Chinen_US
dc.contributor.authorKuo, Hao-Chungen_US
dc.date.accessioned2014-12-08T15:08:23Z-
dc.date.available2014-12-08T15:08:23Z-
dc.date.issued2009-11-01en_US
dc.identifier.issn0741-3106en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LED.2009.2029985en_US
dc.identifier.urihttp://hdl.handle.net/11536/6491-
dc.description.abstractThe enhancement of light extraction from GaN-based light-emitting diodes (LEDs) with a double 12-fold photonic quasi-crystal (PQC) structure using nanoimprint lithography is presented. At a driving current of 20 mA on a transistor-outline-can package, the light output power of an LED with a nanohole patterned sapphire substrate (NHPSS) and an LED with a double PQC structure are enhanced by 34% and 61%, compared with the conventional LED. In addition, the higher output power of the LED with the double PQC structure is due to better reflectance on NHPSS and higher scattering effect on p-GaN surface using a 12-fold PQC structure pattern. These results provide promising potential to increase the output powers of commercial light-emitting devices.en_US
dc.language.isoen_USen_US
dc.subjectGallium nitride (GaN)en_US
dc.subjectlight-emitting diodes (LEDs)en_US
dc.subjectnanoimprint lithography (NIL)en_US
dc.subjectphotonic quasi-crystal (PQC)en_US
dc.titleImproved Light Output Power of GaN-Based Light-Emitting Diodes Using Double Photonic Quasi-Crystal Patternsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LED.2009.2029985en_US
dc.identifier.journalIEEE ELECTRON DEVICE LETTERSen_US
dc.citation.volume30en_US
dc.citation.issue11en_US
dc.citation.spage1152en_US
dc.citation.epage1154en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.identifier.wosnumberWOS:000271151500012-
dc.citation.woscount11-
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