完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Liu, Po-Tsun | en_US |
dc.contributor.author | Lee, Jeng-Han | en_US |
dc.contributor.author | Huan, Y. S. | en_US |
dc.contributor.author | Su, David | en_US |
dc.date.accessioned | 2014-12-08T15:08:42Z | - |
dc.date.available | 2014-12-08T15:08:42Z | - |
dc.date.issued | 2009-09-21 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.3233963 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/6663 | - |
dc.description.abstract | Secondary electron potential contrast (SEPC) technology with an in situ dynamic trigger was studied to inspect P(+)/N-well junction leakage arising from P-well misalignment in a static random access memory cell. Combining SEPC with scanning electron microscopy observations allows direct identification of the junction shift. Furthermore, an in situ negative bias applied to the P-well can create a wider depletion region and eliminate the leakage path in P(+)/N-well contacts, allowing the P(+)/N well to operate normally. This proposed in situ dynamic trigger method is a promising and effective approach to investigating device physics under a dynamic scope. (C) 2009 American Institute of Physics. [doi:10.1063/1.3233963] | en_US |
dc.language.iso | en_US | en_US |
dc.title | Application of secondary electron potential contrast on junction leakage isolation | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.3233963 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 95 | en_US |
dc.citation.issue | 12 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | 顯示科技研究所 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.contributor.department | Institute of Display | en_US |
dc.identifier.wosnumber | WOS:000270243800030 | - |
dc.citation.woscount | 4 | - |
顯示於類別: | 期刊論文 |