標題: | Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application |
作者: | Sahoo, Kartika Chandra Lin, Men-Ku Chang, Edward-Yi Lu, Yi-Yao Chen, Chun-Chi Huang, Jin-Hua Chang, Chun-Wei 材料科學與工程學系 Department of Materials Science and Engineering |
關鍵字: | Sub-wavelength Structure;Solar cell;SWS fabrication;Reflectance;Anti-reflective coatings |
公開日期: | 1-七月-2009 |
摘要: | We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen. |
URI: | http://dx.doi.org/10.1007/s11671-009-9297-7 http://hdl.handle.net/11536/7020 |
ISSN: | 1931-7573 |
DOI: | 10.1007/s11671-009-9297-7 |
期刊: | NANOSCALE RESEARCH LETTERS |
Volume: | 4 |
Issue: | 7 |
起始頁: | 680 |
結束頁: | 683 |
顯示於類別: | 期刊論文 |