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dc.contributor.authorYen, Cheng-Chengen_US
dc.contributor.authorKer, Ming-Douen_US
dc.contributor.authorChen, Tung-Yangen_US
dc.date.accessioned2014-12-08T15:09:25Z-
dc.date.available2014-12-08T15:09:25Z-
dc.date.issued2009-06-01en_US
dc.identifier.issn1530-4388en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TDMR.2009.2015938en_US
dc.identifier.urihttp://hdl.handle.net/11536/7194-
dc.description.abstractThe occurrence of transient-induced latchup (TLU) in CMOS integrated circuits (10) under electrical fast-transient (EFT) tests is studied. The test chip with the parasitic silicon-controlled-rectifier (SCR) structure fabricated by a 0.18-mu m CMOS process was used in EFT tests. For physical mechanism characterization, the specific "swept-back" current caused by the minority carriers stored within the parasitic PNPN structure of CMOS ICs is the major cause of TLU under EFT tests. Different types of board-level noise filter networks are evaluated to find their effectiveness for improving the immunity of CMOS ICs against TLU under EFT tests. By choosing the proper components in each noise filter network, the TLU immunity of CMOS ICs against EFT tests can be greatly improved.en_US
dc.language.isoen_USen_US
dc.subjectBoard-level noise filteren_US
dc.subjectelectrical fast transient (EFT)en_US
dc.subjectlatchupen_US
dc.subjectsilicon-controlled rectifier (SCR)en_US
dc.subjecttransient-induced latchup (TLU)en_US
dc.titleTransient-Induced Latchup in CMOS ICs Under Electrical Fast-Transient Testen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TDMR.2009.2015938en_US
dc.identifier.journalIEEE TRANSACTIONS ON DEVICE AND MATERIALS RELIABILITYen_US
dc.citation.volume9en_US
dc.citation.issue2en_US
dc.citation.spage255en_US
dc.citation.epage264en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000266722900021-
dc.citation.woscount2-
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