完整後設資料紀錄
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dc.contributor.authorChen, Y. C.en_US
dc.contributor.authorLin, Q. R.en_US
dc.contributor.authorChu, Y. H.en_US
dc.date.accessioned2014-12-08T15:09:45Z-
dc.date.available2014-12-08T15:09:45Z-
dc.date.issued2009-03-23en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.3109779en_US
dc.identifier.urihttp://hdl.handle.net/11536/7467-
dc.description.abstractWe present a quantitative study of 180 degrees domain wall motion in epitaxial BiFeO(3) (111) films, which can be treated as a nearly ideal single-domain environment. The domains were dynamically written by applying voltage pulses and examined by the piezoresponse force microscope technique. A transition of domain growth behaviors from the activated type to the nonactivated type was observed when increasing the pulse voltages. The obtained activation field was close to the ideally thermodynamic switching field of BiFeO(3). The asymmetry of activated fields showed the preference of the downward polarization in the BiFeO(3)/SrRuO(3) films.en_US
dc.language.isoen_USen_US
dc.titleDomain growth dynamics in single-domain-like BiFeO(3) thin filmsen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.3109779en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume94en_US
dc.citation.issue12en_US
dc.citation.spageen_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
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