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dc.contributor.authorGuo, Jyh-Chyurnen_US
dc.contributor.authorTsai, Yi-Hsiuen_US
dc.date.accessioned2014-12-08T15:10:02Z-
dc.date.available2014-12-08T15:10:02Z-
dc.date.issued2009-02-01en_US
dc.identifier.issn0018-9480en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMTT.2008.2009903en_US
dc.identifier.urihttp://hdl.handle.net/11536/7659-
dc.description.abstractAn enhanced lossy substrate model is developed with important features of broadband accuracy and scalability. The broadband accuracy is justified by a good match with open pad S-parameters measured up to 110 GHz and MOSFETs' S- and Y-parameters over 40 GHz. The proven model can accurately simulate four noise parameters (NF(min), R(n), Re(Y(opt)), and Im(Y(opt))) and power spectral density of current noises (S(id) and S(ig)). The scalability has been validated over nanoscale MOSFETs with different finger numbers and adopting various pad structures (lossy, normal, and small pads). This scalable lossy substrate model attributed to two substrate RLC networks under the pads and transmission lines (TMLs) can consistently predict the abnormally strong finger number dependence and nonlinear frequency dependence of noise figure (NF(min)) revealed in devices with lossy pads. The enhanced model is useful in guiding pad and TML layouts for effective reduction of extrinsic noises and low noise design. Using a normal pad structure, the NF(min) can be effectively suppressed to approach the intrinsic performance, which is nearly independent of finger numbers.en_US
dc.language.isoen_USen_US
dc.subjectBroadbanden_US
dc.subjectlossy substrateen_US
dc.subjectnanoscale MOSFETen_US
dc.subjectpaden_US
dc.subjectRF noiseen_US
dc.subjectscalableen_US
dc.titleA Broadband and Scalable Lossy Substrate Model for RF Noise Simulation and Analysis in Nanoscale MOSFETs With Various Pad Structuresen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TMTT.2008.2009903en_US
dc.identifier.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUESen_US
dc.citation.volume57en_US
dc.citation.issue2en_US
dc.citation.spage271en_US
dc.citation.epage281en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000263479900004-
dc.citation.woscount5-
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