新型光子晶體雷射製程之研究

Abstract

在這篇論文中首先我們介紹了光子晶體結構的基本原理以及我們的研究動機,再來對其歷史發展做一概略性的介紹與討論。

在光子晶體的製程中,為了結合雷射共振腔與光子晶體結構,我們使用了電子束微影法、乾式蝕刻和濕式蝕刻的製程去做成一種層狀結構的光子晶體雷射,在另一方面,我們亦引入了非對稱型的光子晶體雷射。

為了得到更好的光譜特性,我們介紹了各種晶圓接合技術去整合含有多層量子井結構的晶圓與其不相容的材料,我們利用直接接合和溶膠接合的方法去接合1550nm長波長的多層量子井晶圓與含有DBR結構的晶圓或sapphire,並對於各種接合影響因素與材料的選擇加以討論,最後再對我們的層狀光子晶體雷射和晶圓接合後的樣本做量測。

In this thesis, first we introduce the principles of photonic crystal structures and our research motive. The history and developments of photonic crystal lasers are also described and discussed. In the fabrication of photonic crystals, in order to combine the laser cavity and photonic crystal structure, we use electron-beam lithography, dry etching, and undercut process to form a membrane photonic crystal laser. We also introduce photonic crystal lasers with asymmetric structure. In order to obtain better characteristics of photonic crystal lasers, the wafer bonding technology is introduced to integrate MQWs wafer with different uncompatible wafers. We utilize the direct bonding method and glue bonding method to integrate the 1550nm long-wavelength MQWs with DBR wafer or sapphire. The effect factors of bonding process and choice of bonding materials are discussed. At last, we measure the photoluminescence spectra of our membrane devices and bonding samples.