标题: 应用反应曲面法改善液晶显示器之彩色滤光片制程能力问题
An Application of Response Surface Methodology to Improve TFT-LCD Color Filter Process Capability
作者: 林慈惠
彭文理
管理学院工业工程与管理学程
关键字: 实验设计;反应曲面法;彩色滤光片;中央合成设计;Design of Experiment;Response Surface Methodology;Color Filter;Central Composite Design
公开日期: 2006
摘要: 薄膜电晶体液晶平面显示器(Thin Film Transistor Liquid Crystal Display,TFT-LCD)的彩色化毫无疑问是一定的趋势,因而含有红色、绿色、蓝色三原色的彩色滤光片,乃成为重要且必备的周边材料,由于一片液晶显示面板是由一片相等大小的彩色滤光片(Color Filter,CF)配对一片薄膜电晶体阵列(TFT Array) 所制造而成,因此彩色滤光片品质的好坏对液晶显示面板的色彩表现有决定性的影响。
在 TFT- LCD 面板组装过程中,需藉由间隙子(Spacer)均匀地分布在基板上,以作为薄膜电晶体(TFT)与彩色滤光片(CF)间之支撑,并维持薄膜电晶体与彩色滤光片间的间隙以灌注液晶。光阻柱状物(Photo Spacer,PS)是采用感光性树脂材料,利用已经非常成熟的微影制程(Photolithography)制作间隙子,将间隙子制作在黑色矩阵(Black Matrix,BM)上,如此可精确的控制间隙子大小及所在位置,防止间隙子移动,使液晶包间隙(Cell Gap)维持良好的均匀度,同时可避免间隙子周围漏光以提高对比。
本研究即针对彩色滤光片中之光阻柱状物制程问题加以探讨,并建立两阶段实验设计模式,第一阶段以部分因子实验法筛选出显着因子,第二阶段以反应曲面法(Response Surface Methodology,RSM)加上中央合成设计 (Central Composite Design,CCD)与愿望函数(Desirability Function)找出显着因子之最佳解组合,并进一步找出适合之操作范围,以确保制程能力(Process Index Capability)处于稳定状态。
There is a tendency towards colorized Thin Film Transistor Liquid Crystal Display (TFT-LCD) undoubtedly. The color filter, which contains three fundamental colors of red, green, and blue, is an important and essential raw material for TFT-LCD. One panel of TFT-LCD is assembled by a pair of the same size of TFT Array and color filter, therefore, color filter with good quality is very important, it is significant influence to the performance of TFT-LCD.
In the process of TFT-LCD assembly, the supports between thin film transistor and color filter substrate depend on the uniform distribution of spacer, it also keeps the gap between thin film transistor and color filter for injection liquid crystal. The content of photo spacer is photosensitive resin, photo spacer size and photo spacer precision can be controlled since it is manufactured by the mature photolithography process on the black matrix of color filter, one of the advantages of photo spacer is to prevent moving of bead type spacer to keep the good uniformity of cell gap, it also prevents light leakage around the
spacer to get higher contrast.
This research focuses on the problem of photo spacer process of color filter and builds two steps Design of Experiment method model. The first step is considering the all factors that will inference photo spacer process, apply the factional factorial experiment method to find out the critical factors. The second step applies Response Surface Methodology with Central Composite Design, the purpose is to find the optimum parameters setting and suitable process
operation range to ensure process index capability.
URI: http://140.113.39.130/cdrfb3/record/nctu/#GT008963503
http://hdl.handle.net/11536/79491
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