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dc.contributor.authorChen, Ming-Jeren_US
dc.contributor.authorLu, Li-Fangen_US
dc.contributor.authorHsu, Chih-Yuen_US
dc.date.accessioned2014-12-08T15:10:33Z-
dc.date.available2014-12-08T15:10:33Z-
dc.date.issued2008-12-01en_US
dc.identifier.issn0018-9383en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TED.2008.2006532en_US
dc.identifier.urihttp://hdl.handle.net/11536/8069-
dc.description.abstractWe perform Monte Carlo particle simulations on a silicon conductor for the purposes of reexamining the channel backscattering in bulk nano-MOSFETs. The resulting mean free path lambda(0) for backscattering in a long and near-equilibrium conductor is constant, regardless of the potential profile. However, the apparent mean free path lambda(1) in a local quasi-ballistic k(B)T layer depends on the curvature of the potential profile. In a linear potential profile, the lambda(1) extracted in a wide range of the conductor length (15 to 100 nm) and lattice temperature (150 to 300 K) is found to fall below lambda(0). The carrier heating as the origin of reduced mean free path is inferred from the simulated carrier velocity distribution near the injection point. Strikingly, the mean free paths in a parabolic potential profile remain consistent: lambda(1) = lambda(0) This indicates the absence or weakening of the carrier heating in the layer of interest, valid only for the parabolic potential barrier.en_US
dc.language.isoen_USen_US
dc.subjectBackscatteringen_US
dc.subjectMOSFETen_US
dc.subjectnanoscaleen_US
dc.titleOn the Mean Free Path for Backscattering in k(B)T Layer of Bulk Nano-MOSFETsen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TED.2008.2006532en_US
dc.identifier.journalIEEE TRANSACTIONS ON ELECTRON DEVICESen_US
dc.citation.volume55en_US
dc.citation.issue12en_US
dc.citation.spage3594en_US
dc.citation.epage3598en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000261466900036-
dc.citation.woscount1-
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