標題: | 以全像微影法製作一維週期性結構 A study on fabrication of one-dimensional periodic gratings by using holographic lithography |
作者: | 曾士芫 許根玉 林烜輝 光電工程學系 |
關鍵字: | 全像微影;干涉;SU8;負光阻;holographic lithography;grating;SU8;photoresist |
公開日期: | 2006 |
摘要: | 本論文主要是研究利用兩道等強度雷射光束(351nm)相干產生干涉場,並對塗佈在玻璃基版上的SU8負光阻劑曝光,製作一維週期性光柵結構,並調整製作過程中的曝光劑量與曝後熱烤時間,探討對光柵結構深度與表面分佈情況的影響,嘗試找出最適當的製作條件。另外我們量測光柵繞射效率,探討以純量繞射理論描述此光柵繞射行為的可行性。 In this thesis, we use two-beam interference to fabricate one-dimensional periodic gratings on the SU-8 negative photoresist, which is deposited by spin coating onto glass substrates. By properly adjusting the exposure energies and the post-exposure-bake time, the structure of the gratings can be modified. In addition, we also measure the diffraction efficiency, and try to explain the grating diffraction by scalar diffraction theory. |
URI: | http://140.113.39.130/cdrfb3/record/nctu/#GT009424554 http://hdl.handle.net/11536/81374 |
顯示於類別: | 畢業論文 |